HIF 2010
18th International Symposium
on Heavy Ion Inertial Fusion -
Information

Title:	Dr.
Family Name:	Gilson
First Name:	Erik
E-Mail:	egilsonpppl.gov
Affiliation for Badge:	Princeton University
Institute:	Plasma Physics Laboratory
Address (Street):	P.O. Box 451, MS#17
Postal Code, City:	Princeton, New Jersey 08543-0451
Country:	United States
Phone:	609-243-2681
Fax:	609-243-2418
Payment:	Bank transfer to GSI
Author(s):	E. P. Gilson, R. C. Davidson, P. C. Efthimion, I. D. Kaganovich, and Ya. E. Krasik
Institute(s):	Plasma Physics Laboratory, Princeton University Technion, Haifa, Israel
Title:	Plasma source development for the NDCX-I and NDCX-II Neutralized Drift Compression Experiments
Abstract:	In order to facilitate compression of a positive ion charge bunch longitudinally and transversely beyond the limit determined by the space-charge field of the bunch, a source of charge-neutralizing electrons must be provided. Plasma sources have been developed for the NDCX-I and NDCX-II experimental facilities, both for the 2-m-long, field-free drift regions and for the small-diameter interior of the multi-Tesla final focus solenoid. Barium titanate cylinders with a high dielectric coefficient are used to line the wall of the 2-m-long drift region, and, by applying a 9 kV pulse between the inner and outer surfaces of the cylinders, a plasma with a density in the 10^10 cm^-3 range is formed. A compact plasma source 2" long and 1.5" in diameter, also made using barium titanate, has been developed for use in the bore of the final focus solenoid. Plasma generated near the wall of the plasma source will follow the fringing magnetic field lines of the solenoid and help to fill the bore of the magnet with plasma. Improved designs for the barium titanate plasma sources are being considered that use different inner-surface electrode materials and structures, and also use a modified electrical driver employing a spark gap crowbar switch. In addition, plasma source designs using so-called flashboard technology have been developed. In these plasma sources, high density plasma is formed when the applied high voltage pulse causes a series of breakdowns between isolated copper patches aligned in rows along the surface of the 0.1 mm thick flashboard.
	0

HIF2010 Registration Main Page